Article

Short Communications
2013. V. 51. № 5. P. 712–715
Kostanovskii A.V., Pronkin A.A., Kirichenko A.N.
Formation of a thin film containing $\alpha$-carbine in the magnetron sputtering of graphite targets and the impact of an external photoactivation source
Annotation
The possibility of formation of a thin film containing $\alpha$-carbine in magnetron sputtering of graphite targets and the impact of an external photoactivation source with the spectral density of the radiation flux $\sim5\times10^8\text{W/m}^3$ at the wavelength of $300\text{ nm}$ and at the substrate temperature $\sim660\text{ K}$ is shown experimentally.
Article reference:
Kostanovskii A.V., Pronkin A.A., Kirichenko A.N. Formation of a thin film containing $\alpha$-carbine in the magnetron sputtering of graphite targets and the impact of an external photoactivation source, High Temp., 2013. V. 51. № 5. P. 712